Chia-Wen Tsao
National Central University, Taiwan
Title: Nanostructured silicon based mass spectrometry detection enhancement by vacuum desiccation approach
Biography
Biography: Chia-Wen Tsao
Abstract
Nanoscale silicon technology have been used in many important applications such as high sensitivity surface-assisted laser desorption/ionization mass spectrometry (MS) material. The nanostructured silicon mass spectrometry (nSi-MS) is a matrix-free approach because the organic matrix in conventional MALDI-MS is replaced by the high surface-to-area ratio nanoscale porous silicon surface. An important issue in using nSi-MS analysis is the nSi chip preservation and stability. This is less detail reported in academic publications since all of the can be fresh-made before use. However, it may become critical issue if consider for commercial use. Storage of nanoscale silicon in room environment for a periods of time were found to have MS sensitivity decay. This was believed due to the silicon surface oxidation which limits the commercial products shelf life or the capability obtaining the optimum MS detection sensitivity unless the silicon surface was fresh-made. The most common way to reactive the surface is double etch in a hydrofluoric acid or buffered oxide etch to remove the oxide layer on the silicon surface. This procedure improves the MS detection sensitivity to a certain level. However MS sensitivity degrades from fresh surface. In this conference, we investigate the nSi surface performance under different preservation conditions. We also report a simple, environmental friendly hazardous reagent-free vacuum oven desiccation method to reactive and further enhance the nSi-MS performance. The nSi-MS signal intensity maintain with storage time. Other storage conditions like air, nitrogen will be report in the conference.